Xiao-Kun Wang, B.Sc.

Researcher

Address
Ruhr-Uni­ver­si­tät Bo­chum
Fakultät für Elektrotechnik und Informationstechnik
Angewandte Elektrodynamik und Plasmatechnik
Uni­ver­si­täts­stra­ße 150
D-44801 Bo­chum, Germany

Room
ID 1/114

Phone
+49 234 32 22766

Email
xwang(at)aept.rub.de


Publications

Wang, X.-K., Masheyeva, R., Liu, Y.-X., Song, Y.-H., Hartmann, P., Donkó, Z., & Schulze, J. (2024). Energy efficient F atom generation and control in CF4 capacitively coupled plasmas driven by tailored voltage waveforms. Plasma Sources Science and Technology, 33(8), 085006. https://doi.org/10.1088/1361-6595/ad69c0 Cite
Wang, X.-K., Korolov, I., Wilczek, S., Masheyeva, R., Liu, Y.-X., Song, Y.-H., Hartmann, P., Donkó, Z., & Schulze, J. (2024). Hysteresis in radio frequency capacitively coupled CF4 plasmas. Plasma Sources Science and Technology, 33(8), 085001. https://doi.org/10.1088/1361-6595/ad5eb9 Cite
Liu, J., Wang, X.-K., Wang, L., Zhao, K., Liu, Y., Song, Y., & Wang, Y. (2024). An experimental and computational investigation of discharge mode transitions in a partially magnetized radio frequency capacitively coupled oxygen discharge. Plasma Processes and Polymers, e2300219. https://doi.org/10.1002/ppap.202300219 Cite
Tian, C.-B., Wang, L., Vass, M., Wang, X.-K., Dong, W., Song, Y.-H., Wang, Y.-N., & Schulze, J. (2024). The detachment-induced mode in electronegative capacitively coupled radio-frequency plasmas. Plasma Sources Science and Technology, 33(7), 075008. https://doi.org/10.1088/1361-6595/ad5df8 Cite
Masheyeva, R., Vass, M., Wang, X.-K., Liu, Y.-X., Derzsi, A., Hartmann, P., Schulze, J., & Donkó, Z. (2024). Electron power absorption in CF 4 capacitively coupled RF plasmas operated in the striation mode. Plasma Sources Science and Technology, 33(4), 045019. https://doi.org/10.1088/1361-6595/ad3c69 Cite
Shi, D.-H., Wang, X.-K., Liu, Y.-X., Donkó, Z., Schulze, J., & Wang, Y.-N. (2024). An experimental and computational study on the ignition process of a pulse modulated dual-RF capacitively coupled plasma operated at various low-frequency voltage amplitudes. Plasma Sources Science and Technology, 33(2), 025012. https://doi.org/10.1088/1361-6595/ad257f Cite
Wang, X.-K., Masheyeva, R., Liu, Y.-X., Hartmann, P., Schulze, J., & Donkó, Z. (2023). The electrical asymmetry effect in electronegative CF 4 capacitive RF plasmas operated in the striation mode. Plasma Sources Science and Technology, 32(8), 085009. https://doi.org/10.1088/1361-6595/acec96 Cite
Fu, Y.-Y., Wang, X.-K., Liu, Y.-X., Schulze, J., Donkó, Z., & Wang, Y.-N. (2022). Effects of ‘step-like’ amplitude-modulation on a pulsed capacitively coupled RF discharge: an experimental investigation. Plasma Sources Science and Technology, 31(8), 085005. https://doi.org/10.1088/1361-6595/ac81e9 Cite
Wang, X.-K., Wang, X.-Y., Liu, Y.-X., Schulze, J., Donkó, Z., & Wang, Y.-N. (2022). Striations in dual-low-frequency (2/10 MHz) driven capacitively coupled CF 4 plasmas. Plasma Sources Science and Technology, 31(6), 064002. https://doi.org/10.1088/1361-6595/ac6692 Cite