Senior Researcher
Address
Ruhr-Universität Bochum
Fakultät für Elektrotechnik und Informationstechnik
Angewandte Elektrodynamik und Plasmatechnik
Universitätsstraße 150
D-44801 Bochum, Germany
Room
ID 1/114
Phone
+49 234 32 22766
Email
wang(at)aept.rub.de
Publications
Liu, J., Wang, X.-K., Wang, L., Zhao, K., Liu, Y., Song, Y., & Wang, Y. (2024). An experimental and computational investigation of discharge mode transitions in a partially magnetized radio frequency capacitively coupled oxygen discharge. Plasma Processes and Polymers, e2300219. https://doi.org/10.1002/ppap.202300219 Cite
Tian, C.-B., Wang, L., Vass, M., Wang, X.-K., Dong, W., Song, Y.-H., Wang, Y.-N., & Schulze, J. (2024). The detachment-induced mode in electronegative capacitively coupled radio-frequency plasmas. Plasma Sources Science and Technology, 33(7), 075008. https://doi.org/10.1088/1361-6595/ad5df8 Cite
Wang, L., Hartmann, P., Donkó, Z., Song, Y.-H., & Schulze, J. (2023). Effects of a radial variation of surface coefficients on plasma uniformity in capacitive RF discharges. Plasma Sources Science and Technology, 32(4), 045002. https://doi.org/10.1088/1361-6595/acc6e9 Cite
Vass, M., Wang, L., Wilczek, S., Lafleur, T., Brinkmann, R. P., Donkó, Z., & Schulze, J. (2022). Frequency coupling in low-pressure dual-frequency capacitively coupled plasmas revisited based on the Boltzmann term analysis. Plasma Sources Science and Technology, 31(11), 115004. https://doi.org/10.1088/1361-6595/ac9754 Cite
Wang, L., Vass, M., Lafleur, T., Donkó, Z., Song, Y.-H., & Schulze, J. (2022). On the validity of the classical plasma conductivity in capacitive RF discharges. Plasma Sources Science and Technology, 31(10), 105013. https://doi.org/10.1088/1361-6595/ac95c1 Cite
Wang, L., Vass, M., Donkó, Z., Hartmann, P., Derzsi, A., Song, Y.-H., & Schulze, J. (2022). Electropositive core in electronegative magnetized capacitive radio frequency plasmas. Plasma Sources Science and Technology, 31(6), 06LT01. https://doi.org/10.1088/1361-6595/ac5ec7 Cite
Wang, L., Vass, M., Donkó, Z., Hartmann, P., Derzsi, A., Song, Y.-H., & Schulze, J. (2021). Magnetic attenuation of the self-excitation of the plasma series resonance in low-pressure capacitively coupled discharges. Plasma Sources Science and Technology, 30(10), 10LT01. https://doi.org/10.1088/1361-6595/ac287b Cite
Wang, L., Hartmann, P., Donkó, Z., Song, Y.-H., & Schulze, J. (2021). 2D Particle-in-cell simulations of charged particle dynamics in geometrically asymmetric low pressure capacitive RF plasmas. Plasma Sources Science and Technology, 30(8), 085011. https://doi.org/10.1088/1361-6595/abf206 Cite
Wang, L., Hartmann, P., Donkó, Z., Song, Y.-H., & Schulze, J. (2021). 2D particle-in-cell simulations of geometrically asymmetric low-pressure capacitive RF plasmas driven by tailored voltage waveforms. Plasma Sources Science and Technology, 30(5), 054001. https://doi.org/10.1088/1361-6595/abf31d Cite
Wang, L., Hartmann, P., Donkó, Z., Song, Y.-H., & Schulze, J. (2021). Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges. J. Vac. Sci. Technol. A, 39, 063004. https://doi.org/10.1116/6.0001327 Cite
Hartmann, P., Wang, L., Nösges, K., Berger, B., Wilczek, S., Brinkmann, R. P., Mussenbrock, T., Juhasz, Z., Donkó, Z., Derzsi, A., Lee, E., & Schulze, J. (2021). Control of electron velocity distributions at the wafer by tailored voltage waveforms in capacitively coupled plasmas to compensate surface charging in high-aspect ratio etch features. Journal of Physics D: Applied Physics, 54, 255202. https://doi.org/10.1088/1361-6463/abf229 Cite
Wang L., De-Qi W., Chong-Biao T., Yuan-Hong S., You-Nian W., 大连理工大学物理学院, 大连 116024,School of Physics, Dalian University of Technology, Dalian 116024, China, 德国波鸿鲁尔大学电子工程与信息科学学院, 波鸿 D-44780,Department of Electrical Engineering and Information Science, Ruhr-University Bochum, Bochum D-44780, Germany, & 美国密歇根州立大学电子与计算机工程学院, 东兰辛 48823,Department of Electrical and Computer Engineering, Michigan State University, East Lansing 48823, USA. (2021). Electron heating dynamics and plasma parameters control in capacitively coupled plasma. Acta Physica Sinica, 70(9), 095214–095214. https://doi.org/10.7498/aps.70.20210473 Cite
Wang, L., Wen, D.-Q., Hartmann, P., Donkó, Z., Derzsi, A., Wang, X.-F., Song, Y.-H., Wang, Y.-N., & Schulze, J. (2020). Electron power absorption dynamics in magnetized capacitively coupled radio frequency oxygen discharges. Plasma Sources Science and Technology, 29(10), 105004. https://doi.org/10.1088/1361-6595/abb2e7 Cite
Hartmann, P., Wang, L., Nösges, K., Berger, B., Wilczek, S., Brinkmann, R. P., Mussenbrock, T., Juhasz, Z., Donkó, Z., Derzsi, A., Lee, E., & Schulze, J. (2020). Charged particle dynamics and distribution functions in low pressure dual-frequency capacitively coupled plasmas operated at low frequencies and high voltages. Plasma Sources Science and Technology, 54, 075014. https://doi.org/10.1088/1361-6595/ab9374 Cite
Wang, L., Wen, D.-Q., Zhang, Q.-Z., Song, Y.-H., Zhang, Y.-R., & Wang, Y.-N. (2019). Disruption of self-organized striated structure induced by secondary electron emission in capacitive oxygen discharges. Plasma Sources Science and Technology, 28(5), 055007. https://doi.org/10.1088/1361-6595/ab17ae Cite